image
image
user-login

6312100

Feb 20, 2024

Rest o flux

Rest o flux is a WORD Trademark filed on Feb 20, 2024 in DELHI through India IP Office.The Trademark is registered to DEEPAK JAIN and was filed by KARAN AGARWAL[23023].

Rest o flux Trademark Information

Application ID

6312100

Status

Objected

Date of Application

Feb 20, 2024

Classes

20

Proprietor(s)

DEEPAK JAIN

Attorney

KARAN AGARWAL[23023]
F-97, 4th Floor, Anna Nagar (East), Chennai - 600102, Tamil Nadu

Type

WORD

Registration State

DELHI

Country

India

Filing Mode

e-Filing

IP Office

DELHI

Used Since

Proposed to be used

Uploaded Documents

1

TM-A(TRADE MARKS APPLICATION)

Feb 20, 2024

2

Reply to Exam Report (MIS-R)

Apr 22, 2024

Correspondence and Notices

1

EXAMINATION REPORT

17746309

Mar 18, 2024

FAQ's for Rest o flux Trademark

The application for Rest o flux was made on Feb 20, 2024
The trademark applicant for Rest o flux is DEEPAK JAIN.
Trademark application has been filed under the class(es) 20.
As per IP India, trademark application is on the following stage: Objected.
Listed application Id of Rest o flux is 6312100.
Trademark attorney of the Rest o flux is KARAN AGARWAL[23023].
Rest o flux Trademark is a WORD mark.
Disclaimer: Vakilsearch assumes no responsibility or liability for any errors or omissions in the content of this page. The data is derived from mca.gov.in and ipindia.gov.in
bulb
Don’t lose your brand like ”
Our experts are here to assist you in finding a similar trademark.
Email
Mobile Number
City/Pincode
  • No results found
4.5
star
(18k+ reviews)
google
1 Lakh+
trademark
TM Registered since 2011