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3381996
Oct 06, 2016
C
Chemical Vapour Deposition Rough
Chemical Vapour Deposition Rough is a Trademark filed on Oct 06, 2016 in through IP Office.The Trademark is registered to (1) KAVIT SUTARIYASingle Firm and was filed by attorney.
C
Chemical Vapour Deposition Rough Trademark Information
Application ID
3381996
Status
Refused
Date of Application
Oct 06, 2016
Classes
14
Proprietor(s)
(1) KAVIT SUTARIYASingle Firm
FAQ's for Chemical Vapour Deposition Rough Trademark
The application for Chemical Vapour Deposition Rough was made on Oct 06, 2016
The trademark applicant for Chemical Vapour Deposition Rough is (1) KAVIT SUTARIYASingle Firm.
Trademark application has been filed under the class(es) 14.
As per IP India, trademark application is on the following stage: Refused.
Listed application Id of Chemical Vapour Deposition Rough is 3381996.
Chemical Vapour Deposition Rough Trademark is a undefined mark.
Disclaimer: Vakilsearch assumes no responsibility or liability for any errors or omissions in the content of this page. The data is derived from mca.gov.in and ipindia.gov.in
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